Title:
パターン評価システム及びパターン評価方法
Document Type and Number:
Japanese Patent JP7305422
Kind Code:
B2
Abstract:
Provided is a technology for evaluating a property of a pattern formed inside a sample from two-dimensional information of the sample. A pattern evaluation system of the present disclosure includes a computer subsystem that executes a process of evaluating a property of a pattern by reading a program from a memory that stores the program for evaluating the property of the pattern formed inside a sample. The computer subsystem executes a process of acquiring an image of the sample; a process of extracting a signal waveform from the image; a process of calculating a feature amount in a predetermined region of the signal waveform; a process of comparing the feature amount with a reference value of the feature amount; and a process of evaluating the property of the pattern based upon a comparison result in the comparison process.
Inventors:
Koichiro Irie
Ayumi Doi
Cheonmyung Lee
Ayumi Doi
Cheonmyung Lee
Application Number:
JP2019090344A
Publication Date:
July 10, 2023
Filing Date:
May 13, 2019
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
G01B15/00; H01L21/66
Domestic Patent References:
| JP2014016174A | ||||
| JP2015533256A | ||||
| JP2018087699A |
Attorney, Agent or Firm:
Patent Attorney Corporation Hiraki International Patent Office