Title:
PATTERN EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP09281478
Kind Code:
A
Abstract:
To provide a pattern exposure method to form a stripe pattern with high efficiency.
In this method, a substrate 2 on which a photosensitive resist film is formed is mounted and fixed to a specified position of a long belt-like base body 1 which is continuously carried in the horizontal direction. An exposure mask 8 having a stripe light-shielding pattern in the parallel direction to the carrying direction of the substrate 2 is used to expose the substrate 2 in a continuous irradiation state to satisfy the desired irradiation of exposure light. Thus, a stripe pattern is formed on the substrate 2.
Inventors:
Mihashi, Noboru
Kumamoto, Yuichi
Sugiura, Takeo
Kumamoto, Yuichi
Sugiura, Takeo
Application Number:
JP1996000096769
Publication Date:
October 31, 1997
Filing Date:
April 18, 1996
Export Citation:
Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03B27/06; G02B5/20; G02F1/1335; G03F7/20; G03B27/02; G02B5/20; G02F1/13; G03F7/20; (IPC1-7): G02F1/1335; G02B5/20; G03B27/06; G03F7/20
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