Title:
PATTERN FORMATION MATERIAL AND PATTERN FORMATION METHOD
Document Type and Number:
Japanese Patent JP2019056025
Kind Code:
A
Abstract:
To provide a pattern formation material and pattern formation method, capable of improving productivity.SOLUTION: A pattern formation material includes a first monomer. The first monomer comprises: a first molecule chain including a first end and second end; a first group ester-bonded with the first end; and a second group ester-bonded with the second end. The first group is one of acrylic acid and methacrylic acid, and the second group is one of acrylic acid and methacrylic acid. The plurality of first elements are either carbon or oxygen, and the number of the plurality of first elements is 6 or more.SELECTED DRAWING: Figure 1
Inventors:
ASAKAWA KOUJI
KIHARA NAOKO
LEE SEEKEI
SASAO NORIKATSU
SAWABE TOMOAKI
SUGIMURA SHINOBU
KIHARA NAOKO
LEE SEEKEI
SASAO NORIKATSU
SAWABE TOMOAKI
SUGIMURA SHINOBU
Application Number:
JP2017179536A
Publication Date:
April 11, 2019
Filing Date:
September 19, 2017
Export Citation:
Assignee:
TOSHIBA MEMORY CORP
International Classes:
C08F20/26; B29C59/02; H01L21/027
Attorney, Agent or Firm:
Masahiko Hinataji
Junichi Kozaki
Hiroshi Ichikawa
Tatsutetsu Shirai
Junichi Kozaki
Hiroshi Ichikawa
Tatsutetsu Shirai