Title:
パターン形成方法、下地剤及び積層体
Document Type and Number:
Japanese Patent JP6813028
Kind Code:
B2
Abstract:
It is an object of the present invention to provide a pattern forming method capable of easily forming a phase-separated structure with high accuracy, even in the case of widening the applicable range of a pattern size. The present invention relates to a pattern forming method comprising: applying an under coating agent onto a substrate, and applying a self-assembly composition for pattern formation to the surface of the substrate, onto which the under coating agent has been applied, and then forming a self-assembly film according to self-assembly phase separation, wherein the self-assembly composition for pattern formation comprises a block copolymer comprising a polymerization unit (a) having at least one selected from a structure represented by a formula (103) and a structure represented by a formula (104), and a polymerization unit (b) having a structure represented by a formula (105).
Inventors:
Kazuyo Morita
Kimiko Hattori
Kimiko Hattori
Application Number:
JP2018547112A
Publication Date:
January 13, 2021
Filing Date:
May 30, 2017
Export Citation:
Assignee:
Oji Holdings Co., Ltd.
International Classes:
B05D1/36; B05D7/24; B32B27/28; B32B27/30; C07H3/00; C07H7/00; C08F251/00; C09D103/00; C09D125/14; C09D133/06; H01L21/3065
Domestic Patent References:
| JP2016108435A | ||||
| JP2014185311A | ||||
| JP2010091630A | ||||
| JP2014047269A | ||||
| JP2016079242A | ||||
| JP2004124088A |
Foreign References:
| WO2012013911A1 | ||||
| WO2012177839A1 | ||||
| WO2009140429A1 | ||||
| WO2014162872A1 |
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes