Title:
パターン形成方法及び洗浄装置
Document Type and Number:
Japanese Patent JP4922858
Kind Code:
B2
Abstract:
A method of forming a pattern includes forming a resist layer on a substrate, cleaning a surface of the substrate under a control that a shear stress acting on an interface between a cleaning liquid and the substrate during the cleaning becomes larger than a shear stress acting on an interface between an immersion liquid and the substrate during immersion exposure, exposing the resist layer by the immersion exposure to form a latent image on the resist layer, and developing the resist layer to form a resist pattern on the substrate.
Inventors:
Shinichi Ito
Application Number:
JP2007197795A
Publication Date:
April 25, 2012
Filing Date:
July 30, 2007
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
H01L21/027; H01L21/304
Domestic Patent References:
| JP2005294520A | ||||
| JP2007158326A | ||||
| JP2005347326A | ||||
| JP2007180253A | ||||
| JP2004207711A |
Attorney, Agent or Firm:
Kenji Yoshitake
Yasukazu Sato
Hiroshi Yoshimoto
Yasushi Kawasaki
Jie Yamanoi
Yasukazu Sato
Hiroshi Yoshimoto
Yasushi Kawasaki
Jie Yamanoi