Title:
パターン形成方法
Document Type and Number:
Japanese Patent JP5884521
Kind Code:
B2
Abstract:
A negative pattern is formed by coating a resist composition onto a substrate, exposure, bake, and development in alkaline water. The resist composition comprises a polymer comprising acid labile group-containing recurring units, adapted to turn soluble in alkaline developer under the action of acid, an acid generator and/or an acid, a photobase generator capable of generating an amino-containing compound, a quencher for neutralizing acid for inactivation, and an organic solvent.
Inventors:
Jun Hatakeyama
Tadashi Iio
Tadashi Iio
Application Number:
JP2012020397A
Publication Date:
March 15, 2016
Filing Date:
February 02, 2012
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/038; G03F7/004; G03F7/11
Other References:
Gu, Xinyu et al.,Photobase generator assisted pitch division,Advances in Resist Materials and Processing Technology,米国,SPIE,2010年 3月25日,7639,763906
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Katsuhiko Masaki