Title:
PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP3273897
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To selectively maintain acidic properties only in the unexposed part of a resist film and to enable a positive surface resolution process by using a specified polymer having a 1st group generating a base when irradiated with energy beams and a 2nd acidic group.
SOLUTION: This pattern forming material is made of a polymer having a 1st group generating a base when irradiated with energy beams and a 2nd acidic group. This polymer is preferably a copolymer represented by the formula or a ter- or higher polymer obtd. by polymerizing the copolymer with other group. In the formula, R1 is H or alkyl, each of R2 and R3 is H or phenyl, R2 and R3 may form cycloalkyl, etc., by cyclization, R4 is H or alkyl, 0<x<1 and 0<y<1.
Inventors:
Takahiro Matsuo
Masataka Endo
Masamitsu Shirai
Masahiro Kadooka
Masataka Endo
Masamitsu Shirai
Masahiro Kadooka
Application Number:
JP538897A
Publication Date:
April 15, 2002
Filing Date:
January 16, 1997
Export Citation:
Assignee:
Matsushita Electric Industrial Co., Ltd
International Classes:
G03F7/004; C08F12/00; C08F20/02; C08F26/00; C08F212/14; C08F220/00; C08F226/02; C08L101/00; G03F7/033; G03F7/038; G03F7/36; G03F7/38; H01L21/027; (IPC1-7): G03F7/004; C08F212/14; C08F220/00; C08F226/02; C08L101/00; G03F7/038; G03F7/38; H01L21/027
Domestic Patent References:
| JP627668A | ||||
| JP4142541A | ||||
| JP4253060A | ||||
| JP425847A | ||||
| JP1163736A | ||||
| JP6250393A | ||||
| JP1124848A | ||||
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| JP1149040A | ||||
| JP7261393A | ||||
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| JP5150459A |
Attorney, Agent or Firm:
Hiroshi Maeda (2 outside)
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