Title:
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
Document Type and Number:
Japanese Patent JP2015045702
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a pattern forming method, an actinic ray-sensitive or radiation-sensitive resin composition, and a resist film using the composition, excellent in sensitivity, limit resolving power, roughness characteristics, exposure latitude (EL), post-exposure baking (PEB) temperature dependency, and focus margin (DOF), and to provide a method for manufacturing an electronic device and an electronic device.SOLUTION: The pattern forming method comprises: (I) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition which comprises a resin having a repeating unit that is decomposed by an action of an acid to produce an alcoholic hydroxyl group and having a weight average molecular weight of 11,000 or more, and a compound expressed by general formula (1) below; (II) a step of exposing the film; and (III) a step of developing the exposed film by using a developing solution containing an organic solvent. In the formula, R represents an alkyl group, cycloalkyl group which may have a carbonyl carbon as a ring member, lactone structure, sultone structure, aryl group or a combination of two or more of the above groups or structures; and Mrepresents a monovalent cation.
Inventors:
KOSHIJIMA KOSUKE
IWATO KAORU
IWATO KAORU
Application Number:
JP2013175935A
Publication Date:
March 12, 2015
Filing Date:
August 27, 2013
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/004; G03F7/038; G03F7/039; G03F7/32; H01L21/027
Domestic Patent References:
| JP2011215333A | 2011-10-27 | |||
| JP2011209520A | 2011-10-20 | |||
| JP2012008500A | 2012-01-12 | |||
| JP2012073402A | 2012-04-12 | |||
| JP2013076990A | 2013-04-25 | |||
| JP2013092723A | 2013-05-16 | |||
| JP2013163652A | 2013-08-22 |
Foreign References:
| WO2006025292A1 | 2006-03-09 |
Attorney, Agent or Firm:
Takamatsu 猛
Toshiyuki Ozawa
Hiromichi Hasegawa
Toshiyuki Ozawa
Hiromichi Hasegawa