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Title:
PATTERN FORMING METHOD, ELECTRON BEAM SENSITIVE OR EXTREME ULTRAVIOLET RAY SENSITIVE RESIN COMPOSITION AND RESIST FILM, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME
Document Type and Number:
Japanese Patent JP2013080004
Kind Code:
A
Abstract:

To provide an actinic ray sensitive or radiation sensitive resin composition that is highly sensitive, capable of suppressing a pattern collapse after development and has a large residual film ratio, and to provide a resist film, a pattern forming method, a method for manufacturing an electronic device, and an electronic device using the same.

There is provided a pattern forming method including the steps of: (1) forming a film using an electron beam sensitive or extreme ultraviolet ray sensitive resin composition including, (A) a resin including a repeating unit having a partial structure represented by the following general formula (A0) in which a solubility of the resin in a developer having an organic solvent is decreased by an action of an acid, and (B) a compound that generates an acid by irradiation with an electron beam or an extreme ultraviolet ray; (2) exposing the film using the electron beam or the extreme ultraviolet ray; and (4) developing the exposed film using a developer having an organic solvent after exposure to form a negative pattern. In the general formula, Ar represents an aromatic ring group that links with a main chain of the resin (A) directly or indirectly, and, Ra represents a hydrogen atom or a group to be eliminated by an action of an acid.


Inventors:
Iwato, Kaoru
Tsubaki, Hideaki
Hirano, Shuji
Application Number:
JP2011000218548
Publication Date:
May 02, 2013
Filing Date:
September 30, 2011
Export Citation:
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Assignee:
FUJIFILM CORP
International Classes:
G03F7/038; C08F212/14; C08F220/30; C08F232/08; G03F7/039; H01L21/027
Domestic Patent References:
JP2006225476A2006-08-31
JP2011170316A2011-09-01
JP2005008766A2005-01-13
JP2013029564A2013-02-07
JP2005084591A2005-03-31
JP2011191741A2011-09-29
JP2011170316A2011-09-01
JP2005008766A2005-01-13
JP2013029564A2013-02-07
JP2011191741A2011-09-29
JP2005084591A2005-03-31
JPH0225850A1990-01-29
JPS6336240A1988-02-16
Attorney, Agent or Firm:
高松 猛
尾澤 俊之
長谷川 博道