Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
PATTERN FORMING METHOD, MASK FORMING METHOD BY USING SAME, AND THIS MASK
Document Type and Number:
Japanese Patent JPH03287163
Kind Code:
A
Abstract:

PURPOSE: To form a desired fine pattern in high precision by directly patterning a coating type glass film without using a resist.

CONSTITUTION: The coating type glass SOG (spin-on-glass) film 23 is formed on an organic coating film 22 by the spin coating method, a substrate 21 is heat treated, a prescribed pattern is drawn by electron beams by using an electron beam drawing device, the substrate 21 is immersed into methanol to develop the film 23, and further rinsed with methanol, and dried to form the pattern 24. The glass film 23 is composed of a silanol compound and a solvent (methanol and the like), the silanol groups are dehydrated and allowed to condense with each other by irradiation with electron beams or ultraviolet rays and the film 23 in the exposed regions becomes difficultly soluble in the organic solvents, thus permitting the film 23 unexposed and nonpatterned regions to be removed and the desired fine pattern to be formed in high precision.


Inventors:
IMAI AKIRA
HASEGAWA NORIO
Application Number:
JP8483690A
Publication Date:
December 17, 1991
Filing Date:
April 02, 1990
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI LTD
International Classes:
G03F1/30; G03F1/68; G03F1/80; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Attorney, Agent or Firm:
Junnosuke Nakamura (1 outside)