Title:
パターン形成方法、パターン形成装置、パターン形成用版、パターン形成用版の製造方法、カラーフィルタの製造方法、導電膜の製造方法及び液晶パネルの製造方法
Document Type and Number:
Japanese Patent JP3780700
Kind Code:
B2
Abstract:
A template 1 is brought close to or in contact with a surface to be patterned 111 and patterns are formed with liquid 62 on the surface 111. This method comprises the steps of: bringing the template 1 close to or essentially in contact with the surface 111, supplying liquid 62 to a plurality of through holes 12 established in the pattern transfer region 10 of the template 1 for supplying the liquid 62, and separating the template 1 from the surface 111 after the liquid 62 is adhered to the surface 111 via the through holes 12.
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Inventors:
Satoshi Nebashi
Nao Nishikawa
Tatsuya Shimoda
Nao Nishikawa
Tatsuya Shimoda
Application Number:
JP14489298A
Publication Date:
May 31, 2006
Filing Date:
May 26, 1998
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
B41F17/14; G02F1/1335; B41J2/01; B41M1/12; G02F1/1343; G03F7/34; H01L21/30; H01L21/311; H01L21/3213; H05K3/10; H05K3/12
Domestic Patent References:
| JP10138453A |
Foreign References:
| US2777411 |
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Osamu Suzawa