To provide a pattern forming method for an insulating film by which the insulating film can be simply and easily patterned and which ensures less damage to the constituent elements of a device, and to provide an electronic device.
The pattern forming method for a polymer insulating film comprises: a step of forming a polymer precursor layer 12 by coating the top of a substrate 11 with a polymer insulating film material containing a heat polymerizable polymer precursor material; a step of selectively polymerizing the polymer precursor layer 12 with a heating means; and a step of removing the unpolymerized polymer precursor material with a solvent which does not dissolve the polymer of the polymerized part 13, but dissolves the unpolymerized part 14. The electronic device has a contact hole formed in a polymer insulating film by the method.
KONDO HIROSHI
TANO TAKANORI
KONDO HITOSHI
| JPS49103639A | 1974-10-01 | |||
| JP2000127640A | 2000-05-09 | |||
| JPS63142030A | 1988-06-14 |