To provide a pattern forming method with which a fine pattern can be formed with high definition, productivity upon pattern formation can be improved, and a prescribed pattern can be formed in a photosensitive composition with high resolution.
The method includes: a photosensitive layer forming step of forming a photosensitive layer and an oxygen block layer on the surface of the substrate with the photosensitive layer in the substrate side; an exposure step of exposing the photosensitive layer to light that is emitted from a light irradiating means, modulated by a light modulating means having n of drawing parts which accept the light from the light irradiating means and emit the light, and then passed through a microlens array having arrayed microlenses having aspheric surfaces which can correct aberration due to distortion of emission faces of the drawing parts; and a developing step of developing the photosensitive layer exposed in the exposure step.
ISHIKAWA HIROMI
SHIMOYAMA YUJI
KODAMA TOMOHIRO
Yoshihiro Nagare