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Title:
PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2014042960
Kind Code:
A
Abstract:

To provide a pattern forming method by which phase separation can be induced in a composition containing a block copolymer without disposing a neutralized film at a bottom part of a guide pattern although the guide pattern used is formed of a resist composition that generates an acid by exposure and has a structural unit (a1) including an acid decomposable group showing an increase in the polarity by an action of an acid.

The pattern forming method comprises the steps of: forming a layer containing a block copolymer on a support body having a guide pattern formed of a resist having a structural unit (a1) so as to cover a bottom surface in a recessed part of the guide pattern; subjecting the layer containing the block copolymer to phase separation; and selectively removing a phase comprising at least one kind of block in the plurality of blocks constituting the block copolymer from the layer containing the block copolymer. A difference as an absolute value between contact angles with water of the bottom surface and a side surface constituting the recessed part of the pattern is 5 degrees or more.


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Inventors:
SENZAKI TAKAHIRO
MIYAGI MASARU
MIYASHITA KENICHIRO
Application Number:
JP2012186759A
Publication Date:
March 13, 2014
Filing Date:
August 27, 2012
Export Citation:
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Assignee:
TOKYO OHKA KOGYO CO LTD
International Classes:
B82B3/00; B29C59/00; B82Y40/00; G03F7/038; G03F7/039; G03F7/40; H01L21/027
Domestic Patent References:
JP2008036491A2008-02-21
JP2013228492A2013-11-07
JP2013209515A2013-10-10
JP2014528015A2014-10-23
JP2014034626A2014-02-24
JP2014033051A2014-02-20
JP2011018778A2011-01-27
JP2012134353A2012-07-12
JP2012051060A2012-03-15
JP2010007070A2010-01-14
JP2010056257A2010-03-11
JP2001151834A2001-06-05
Foreign References:
WO2012046770A12012-04-12
Attorney, Agent or Firm:
Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi



 
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