PATTERN FORMING METHOD

Japanese Patent JP3353744

B2

PROBLEM TO BE SOLVED: To make eliminable an unnecessary pattern on a photosensitive resin by a simple and easy way and to facilitate the formation of a fine pattern as well as to increase the depth of a focus in pattern transfer.
SOLUTION: The pattern of a photomask is transferred to a chemical amplification type photosensitive resin film and an acid is generated in the photosensitive resin film. A crosslinker-containing resin film 9 is formed on the photosensitive resin film. The photosensitive resin film and the crosslinker-containing resin film 9 are heat-treated to diffuse the acid generated in the photosensitive resin film into the crosslinker-containing resin film. By the diffusion, the crosslinker-containing resin film in the interfacial region between the photosensitive resin and the crosslinker-containing resin film is brought into crosslinking reaction to form a reacted layer 10. The crosslinker-containing resin film 9 is removed while leaving the reacted layer 10. An unnecessary transferred pattern 7 in the pattern transferred to the photosensitive resin is eliminated by the reacted layer.

WO/2004/095600	DEPOSITION OF PERMANENT POLYMER STRUCTURES FOR OLED FABRICATION
JP2751572	[Title of Invention] Radiation-sensitive resin composition

Nao Asato
Shinji Ishida

JP17622899A

December 03, 2002

June 23, 1999

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NEC

H01L21/027; G03F7/004; G03F7/26; G03F7/38; G03F7/40; (IPC1-7): G03F7/40; G03F7/004; G03F7/26; H01L21/027

JP1073927A
JP11119443A
JP10274854A
JP495963A
JP11143047A

Naoki Kyomoto (2 outside)

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