Title:
パターン形成基板、電気光学装置、パターン形成基板の製造方法及び電気光学装置の製造方法
Document Type and Number:
Japanese Patent JP4238822
Kind Code:
B2
Abstract:
A patterned substrate manufacturing method is for manufacturing a patterned substrate having a plurality of patterns formed by drying liquid droplets containing a pattern forming material. The patterned substrate manufacturing method includes providing a photothermal conversion part that is configured to convert infrared light into heat on an outside perimeter of each of a plurality of pattern forming regions, each of the pattern forming regions corresponding to each of the patterns, arranging the liquid droplets within the pattern forming regions, shining infrared light on the patterned substrate, and drying the liquid droplets by heat resulting from the photothermal conversion by the photothermal conversion parts.
Inventors:
Naoyuki Toyota
Application Number:
JP2004350816A
Publication Date:
March 18, 2009
Filing Date:
December 03, 2004
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
H05B33/10; B05D1/26; B05D3/02; G02B5/20; H01L51/50; H05B33/02; H05B33/12; H05B33/22
Domestic Patent References:
| JP10282322A | ||||
| JP11142635A | ||||
| JP2003249378A | ||||
| JP2002148429A | ||||
| JP2001276726A |
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Osamu Suzawa