Title:
パターン検査装置及びパターン検査方法
Document Type and Number:
Japanese Patent JP5525739
Kind Code:
B2
Abstract:
A pattern inspection apparatus includes a light source, a stage configured to mount thereon a substrate with a pattern formed thereon, a first laser measuring unit configured to measure a position of the stage by using a laser beam, a sensor configured to capture a pattern image obtained from the pattern, formed on the substrate, irradiated by light from the light source, an optical system configured to focus the pattern image on the sensor, a second laser measuring unit configured to measure a position of the optical system by using a laser beam, a correction unit configured to correct a captured pattern image by using a difference between the position of the stage and the position of the optical system, and an inspection unit configured to inspect whether there is a defect of the pattern by using a corrected pattern image.
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Inventors:
Jewel beetle Shuichi
Application Number:
JP2009067661A
Publication Date:
June 18, 2014
Filing Date:
March 19, 2009
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
G01N21/956; G03F1/84; H01L21/027
Domestic Patent References:
| JP10325711A | ||||
| JP59063725A | ||||
| JP2007102153A | ||||
| JP2008112178A |
Attorney, Agent or Firm:
Mitsuyuki Matsuyama
Tetsuma Ikegami
Tetsuma Ikegami