Title:
PATTERN INSPECTION DEVICE
Document Type and Number:
Japanese Patent JPH07306028
Kind Code:
A
Abstract:
PURPOSE: To accurately inspect a pattern defect according to the size of an inspection pattern by varying the diameter of an electron beam.
CONSTITUTION: After electron beams applied from an electron gun 2 are formed into arbitrary beam shapes, the beams converged by reduction lenses 5 and 6 and further axial deviation is compensated and the beams are converged by objective lenses 9 and 10 and the images are formed on the surface of a sample 12, where the focus distances of the reduction lenses 5 and 6 and the objective lenses 9 and 10 are controlled.
Inventors:
NISHIGAKI HISASHI
NISHIMURA CHIKASUKE
HOSAI HIROAKI
KINOSHITA HIDETOSHI
FUKUTOME YUJI
NISHIMURA CHIKASUKE
HOSAI HIROAKI
KINOSHITA HIDETOSHI
FUKUTOME YUJI
Application Number:
JP9859294A
Publication Date:
November 21, 1995
Filing Date:
May 12, 1994
Export Citation:
Assignee:
TOSHIBA CORP
International Classes:
G01B15/00; H01L21/66; (IPC1-7): G01B15/00; H01L21/66
Attorney, Agent or Firm:
Takehiko Suzue