Title:
PATTERN INVERSION COMPOSITION RESPONSIVE TO LIGHT OR ELECTRON BEAM, AND PATTERN FORMING METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2020027841
Kind Code:
A
Abstract:
To provide a composition (covering material) for flattening a stepped base plate of which the density difference is large and in which a step to be covered is wide.SOLUTION: The present invention relates to an organic pattern flattening composition which contains polysiloxane containing a hydrolyzed condensate of a hydrolyzable silane raw material, and a solvent and is applied onto an organic pattern. In the composition, the polysiloxane contains a silanol group in a ratio equal to or less than 40 mol% with respect to an Si atom, a weight average molecular weight of the polysiloxane ranges from 1,000 to 50,000, and a ratio of a mass of carbon atoms with respect to a total mass of silicon atoms, carbon atoms and oxygen atoms in the polysiloxane is 10 to 40%.SELECTED DRAWING: None
Inventors:
SHIGAKI SHUHEI
NAKAJIMA MAKOTO
SHIBAYAMA WATARU
ISHIBASHI KEN
NAKAJIMA MAKOTO
SHIBAYAMA WATARU
ISHIBASHI KEN
Application Number:
JP2018151064A
Publication Date:
February 20, 2020
Filing Date:
August 10, 2018
Export Citation:
Assignee:
NISSAN CHEMICAL CORP
International Classes:
H01L21/312; C08G77/16; G03F7/20; G03F7/40; H01L21/3065
Attorney, Agent or Firm:
Patent business corporation Tsukuni