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Title:
PATTERN MATCHING SYSTEM
Document Type and Number:
Japanese Patent JPS6033676
Kind Code:
A
Abstract:

PURPOSE: To calculate the resemblance among feature vector groups which are not systematized by a dynamic planning method at a high speed, by defining that the features of the input side are ordered irregularly against the systematized features of the mask side.

CONSTITUTION: The rectilinear approximation of a boundary part between white and black is used for both input and mask sides in order to decrease the distortions of information and the corresponding candidate points. Then it corresponds by referring that the features of the input side are irregular in order against the systematized features of the mask side. This secures a matching operation having high resistance even to the cut of a line. At the same time, the gathering of precedable segments is defined to each contour line of the input side to increase the processing speed. Thus the unnatural correspondence is prevented. The connecting state between the preceding and next contour lines is evaluated in addition to the distance between segments. This can evaluate the overlapping degrees and the distorted degrees produced when the space is distorted nonlinearly.


Inventors:
Yamada, Hirozo
Yamamoto, Kazuhiko
Oka, Riyuuichi
Funakubo, Noboru
Application Number:
JP1983000143288
Publication Date:
February 21, 1985
Filing Date:
August 05, 1983
Export Citation:
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Assignee:
AGENCY OF IND SCIENCE & TECHNOL
International Classes:
G10L11/00; G06K9/46; G06K9/62; G06T7/00; G10L15/12; (IPC1-7): G06K9/62; G10L5/06



 
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