Title:
PATTERN MEASURE INSPECTING AND IMAGE RECOGNITION ASSISTANCE PATTERN
Document Type and Number:
Japanese Patent JP2001325586
Kind Code:
A
Abstract:
To reduce an image recognition error in measure inspection.
For a measure inspection pattern 2, image recognition assistance patterns 6 and 8 in arrow shapes are installed on both the sides of a measurement place. The image recognition assistance patterns 6 and 8 are so sized as to have no projection from an image recognition area 10 and the ratios of the total area of the patterns 2, 6, and 8 to the area of the image recognition area 10 is 30 to 10%. Further, the interval (b) between the image recognition assistance patterns 6 and 8 and the measure measurement place of the measure inspection pattern is equal to or larger than the width (a) of the measure measurement place.
Inventors:
SAGAWA KOICHI
Application Number:
JP2000142657A
Publication Date:
November 22, 2001
Filing Date:
May 16, 2000
Export Citation:
Assignee:
RICOH KK
International Classes:
G01B11/02; G03F1/42; G06T1/00; H01L21/66; H01L23/544; G01B11/00; (IPC1-7): G06T1/00; G01B11/00; G01B11/02; H01L21/66
Attorney, Agent or Firm:
Noguchi Shigeo