Title:
PATTERN MEASUREMENT DEVICE AND COMPUTER PROGRAM
Document Type and Number:
Japanese Patent JP2017067443
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a pattern measurement device that quantitatively evaluates a pattern formed by a DSA method with high accuracy.SOLUTION: The present invention proposes a pattern measurement device for measuring a dimension between patterns formed in a sample. The pattern measurement device finds the centers of gravity of a plurality of patterns included in an image, finds the distance between the centers of gravity of the plurality of patterns, etc., and on the basis of the found distance between the centers of gravity, etc., identifies a pattern of a specific condition to patterns different from the pattern of the specific condition or calculates information pertaining to the number of patterns of the specific condition, the size of an area that includes the pattern of the specific condition, and the number of virtual line segments between the patterns of the specific condition.SELECTED DRAWING: Figure 1
Inventors:
SUGIYAMA AKIYUKI
IZAWA MIKI
YAMAGUCHI SATOSHI
HOMMI MOTONOBU
IZAWA MIKI
YAMAGUCHI SATOSHI
HOMMI MOTONOBU
Application Number:
JP2013270811A
Publication Date:
April 06, 2017
Filing Date:
December 27, 2013
Export Citation:
Assignee:
HITACHI HIGH TECH CORP
International Classes:
G01B15/00; G01B15/04
Attorney, Agent or Firm:
Manabu Inoue
Yuji Toda
Shigemi Iwasaki
Yuji Toda
Shigemi Iwasaki
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