Title:
パターン測定装置、方法及びプログラム、並びに、パターン検査装置、方法及びプログラム
Document Type and Number:
Japanese Patent JP7211627
Kind Code:
B2
Abstract:
Provided is technology for measuring a pattern and inspecting the measured pattern without relying on empirical assumptions by an operator of a pattern inspecting device. This pattern inspecting device for inspecting a plurality of types of pattern formed on a target object is provided with: an input unit for inputting image data of the target object; an external shape extracting unit for extracting the external shapes of the plurality of types of pattern from the image data of the target object; a calculating unit for calculating quantified data relating to the external shape from the extracted external shape; and a comparing unit for comparing the quantified data relating to the external shape with external shape quantified data in a recipe.
Inventors:
Akio Ishikawa
Application Number:
JP2020071342A
Publication Date:
January 24, 2023
Filing Date:
April 10, 2020
Export Citation:
Assignee:
alitecs Co., Ltd.
International Classes:
H01L21/66; G01B15/04; G03F7/20
Domestic Patent References:
| JP2018017835A | ||||
| JP2008182114A |
Attorney, Agent or Firm:
Tetsuo Yahagi