Title:
パターン測定装置、パターン測定装置における傾き算出方法およびパターン測定方法
Document Type and Number:
Japanese Patent JP7241611
Kind Code:
B2
Abstract:
An object of the present invention is to provide a technique capable of accurately measuring a pattern shape. According to an embodiment of the present invention, provided is a pattern measuring device comprising a transport unit, a pattern projection unit, an image capturing unit, and a measuring unit. The transport unit transports a substrate. The pattern projection unit is disposed above the transport unit and projects a projection pattern onto the substrate transported by the transport unit. The imaging capturing unit is disposed above the transport unit and captures an image of the projection pattern projected onto the substrate or an actual pattern formed on the substrate. The measuring unit measures a shape of the projection pattern or the actual pattern based on the image captured by the image capturing unit.
Inventors:
Fujiwara Shin
Kotaro Onoe
Kotaro Onoe
Application Number:
JP2019105878A
Publication Date:
March 17, 2023
Filing Date:
June 06, 2019
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
G01B11/24; G01B11/26; H01L21/66; H05K3/00
Domestic Patent References:
| JP4148814A | ||||
| JP2015072257A |
Attorney, Agent or Firm:
Sakai International Patent Office
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