Title:
パターン計測方法、計測システム、及びコンピュータ可読媒体
Document Type and Number:
Japanese Patent JP7411042
Kind Code:
B2
Abstract:
The present disclosure pertains to a method, a system, and a computer-readable medium for highly precisely measuring the depth of a recess formed in a sample even when, inter alia, the material or pattern density of the sample differs. In order to achieve the purpose described above, there are proposed a method, a measurement system, and a non-temporary computer-readable medium for storing program commands that can be executed by a computer system, the method, system, and medium involving: using a measurement tool to acquire an image or a brightness distribution of a region including a recess formed in a sample; extracting a first characteristic of the interior of the recess, and a second characteristic pertaining to the dimensions or area of the recess, from the acquired image or brightness distribution; and inputting the extracted first characteristic and second characteristic to a model that indicates the relationship between the first characteristic, the second characteristic, and a depth index of the recess to thereby derive the depth index of the recess.
Inventors:
Ayumi Doi
Makoto Suzuki
Daisuke Bizen
Shunsuke Mizutani
Makoto Suzuki
Daisuke Bizen
Shunsuke Mizutani
Application Number:
JP2022153950A
Publication Date:
January 10, 2024
Filing Date:
September 27, 2022
Export Citation:
Assignee:
Hitachi High-Tech Co., Ltd.
International Classes:
G01B15/00; H01J37/22
Domestic Patent References:
JP61239107A | ||||
JP201912766A | ||||
JP11248442A | ||||
JP2010175249A | ||||
JP6316578B2 | ||||
JP6310075A |
Foreign References:
WO2014175150A1 | ||||
US6930308 |
Attorney, Agent or Firm:
Patent Attorney Corporation Hiraki International Patent Office
Previous Patent: Quaternary amine formulations and their uses
Next Patent: Benefit calculation system, benefit calculation method, and program
Next Patent: Benefit calculation system, benefit calculation method, and program