PATTERN-PROCESSED MATERIAL, METHOD FOR PRODUCING THE SAME MATERIAL AND DEVICE FOR PRODUCING THE SAME MATERIAL

Title:

PATTERN-PROCESSED MATERIAL, METHOD FOR PRODUCING THE SAME MATERIAL AND DEVICE FOR PRODUCING THE SAME MATERIAL

Document Type and Number:

Japanese Patent JP2002020964

Kind Code:

A

Abstract:

To provide a pattern-sewn cloth obtained by forming patterns on the cloth with only an upper yarn and fixing their plural free loops to the rear surface side of the cloth, a method for producing such pattern-sewn cloth and a device for producing the pattern-sewn cloth.

This pattern-sewn cloth obtained by piercing a yarn 88 by plural timed through a cloth 70 for forming a pattern and also leaving the plural free loops 76 at the rear surface side of the cloth 70 is provided by installing double surface tape 77 for fixing the plural free loops 76 at the rear surface of the cloth 70, forming the pattern by sewing by using a hollow needle 81, having an elastic membranous material in the cloth 70 and leaving the free loops 76 at the rear surface side of the cloth 70 by the elastic membranous material.

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Inventors:

SHIMIZU YASUHIRO

Application Number:

JP2000201244A

Publication Date:

January 23, 2002

Filing Date:

July 03, 2000

Export Citation:

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Assignee:

BROTHER IND LTD

International Classes:

D05B1/02; D05B19/02; D05C17/00; (IPC1-7): D05C17/00; D05B1/02; D05B19/02

Attorney, Agent or Firm:

Toshio Okamura

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