PATTERN TESTER AND TESTING METHOD THEREFOR

Japanese Patent JP3432739

B2

PROBLEM TO BE SOLVED: To evaluate pattern positioning accuracy with high resolution and adequate throughput.
SOLUTION: This device is provided with a reference data generation part 31 for generating reference data, sensor data generation part 32 for generating sensor data, and a multiplier 21 for mutually multiplying the reference data and the sensor data. The reference data generation part 31 has an input device 11 for inputting position coordinates of a stage which hold a non-measured sample and design data of two-dimensional drawing data, a reference data generation circuit 13 for converting the position coordinates and two-dimensional drawing data for generating the reference data, and a first subtraction circuit 14 for subtracting a first offset value from the reference data. Furthermore, the sensor data generation part 32 has a photoelectric converter 15 for converting an optical signal from a pattern on the non-measured sample 3 into an electrical signal, an A/D converter 16 connected to the photoelectric converter 15, and a second subtraction circuit 17 for subtracting a second offset value from an output of the A/D converter 16.

JPH0346319	EXPOSURE BY X-RAYS
JPS61247023	MANUFACTURE OF SEMICONDUCTOR DEVICE
WO/2001/003173	METHOD FOR PATTERNING A LAYER OF A LOW DIELECTRIC CONSTANT MATERIAL

Kyoji Yamashita

JP5855198A

August 04, 2003

March 10, 1998

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Toshiba Corporation

H01L21/027; G03F1/84; (IPC1-7): G03F1/08; H01L21/027

JP1032161A
JP7243982A
JP7128248A
JP6349715A
JP6175353A
JP4261538A
JP4100044A

Hidekazu Miyoshi (3 outside)

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