Title:
パターン転写装置
Document Type and Number:
Japanese Patent JP7105631
Kind Code:
B2
Abstract:
To provide a pattern transfer device having a new configuration with less inconvenience, for example.SOLUTION: A pattern transfer device according to an embodiment includes, for example: a transfer roll that is wound and rotated with a substrate coated with a photocurable resin and transfers a pattern onto the photocurable resin; a press roll that presses a second surface of the substrate coated with the photocurable resin toward the transfer roll; a light irradiation mechanism that cures the photocurable resin by irradiating the photocurable resin to which the pattern is transferred with light; a piston that presses the pressure roll toward the transfer roll; and a cylinder that movably stores the piston. The pattern transfer device comprises: a pressing mechanism in which a pressure chamber facing the piston is provided and that pressurizes the piston with fluid pressure in the pressure chamber; and a pressure control mechanism that adjusts the pressure in the pressure chamber to a constant level.SELECTED DRAWING: Figure 4
Inventors:
Mitsuaki Serizawa
Application Number:
JP2018123316A
Publication Date:
July 25, 2022
Filing Date:
June 28, 2018
Export Citation:
Assignee:
Shibaura Machinery Co., Ltd.
International Classes:
B29C59/04
Domestic Patent References:
| JP2017007184A | ||||
| JP2003001706A | ||||
| JP6047806A |
Foreign References:
| US20090056858 | ||||
| WO2007040023A1 |
Attorney, Agent or Firm:
Sakai International Patent Office