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Patent Searching and Data


Title:
PATTERN TRANSFER METHOD AND DEVICE
Document Type and Number:
Japanese Patent JPH04112075
Kind Code:
A
Abstract:

PURPOSE: To perform a transferring with high dimensional precision and reproducibility by using a pattern transfer plate whose pattern forming face is curved having an end part and pressing pressure transfer patterns to a work lithography in turn along the curved face.

CONSTITUTION: A pattern transfer plate 1 provided with transfer patterns 3 is arranged facing a work lithography 2. The pattern transfer plate 1 is formed by a curved face with a pattern forming face having an end part. The transfer pattern 3 can be formed by using properly, for example, various inks or metallic film having a sticking layer on a contacting face with the work lithography 2. For example, a work surface plate 20 which holds the work lithography 2 is moved in the direction of the pattern transfer plate 2, so that a part of the transfer patterns 3 is pressed with pressure to the work lithography 2 in a state that the part of the transfer patterns 3 is contacted with the work lithography 2. When the transfer patterns 3 are pressed with pressure to the work lithography 2 in turn along the curve of the pattern forming face, the transfer patterns 3 are transferred continuously on the work lithography 2, so that a predetermined pattern can be formed on the work lithography 2.


Inventors:
TAKEUCHI SATOSHI
ASAKA KENJI
Application Number:
JP23156590A
Publication Date:
April 14, 1992
Filing Date:
August 31, 1990
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
B41F16/00; B41M3/00; C23F1/00; H01L21/027; H05K3/12; H05K3/20; (IPC1-7): B41F16/00; B41M3/00; C23F1/00; H01L21/027; H05K3/12
Attorney, Agent or Firm:
Yasuo Ishikawa (2 outside)