ペリクルのデマウント方法、及び、ペリクルのデマウント装置

Title:

ペリクルのデマウント方法、及び、ペリクルのデマウント装置

Document Type and Number:

Japanese Patent JP7204009

Kind Code:

B2

Abstract:

The disclosure addresses provision of a pellicle demounting method having excellent property with respect to reduction of contamination of a photomask. A method of demounting a pellicle, the method is provided which includes: a step of providing a stack including a photomask (805), a pellicle frame (803), and a pellicle film (802) that are arranged in this order; a step of providing an electrode (810); and a demounting step including disposing the stack and the electrode (810) such that the pellicle film (802) in the stack and the electrode (810) face each other, and applying a voltage to the electrode (810) to generate an electrostatic attractive force, which attracts the pellicle film (802) in a direction toward the electrode (810), thereby demounting the pellicle film (802) from the photomask (805) in the stack

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Inventors:

Ishikawa Akira
Kazuo Takamura

Application Number:

JP2021564032A

Publication Date:

January 13, 2023

Filing Date:

December 10, 2020

Export Citation:

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Assignee:

Mitsui Chemicals, Inc.

International Classes:

G03F1/62

Domestic Patent References:

JP2016206527A
JP2016218162A
JP6057841A
JP2005509185A
JP1026821A

Foreign References:

US20190094683
US20150309404

Attorney, Agent or Firm:

Patent Attorney Corporation Taiyo International Patent Office

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