Title:
PELLICLE AND EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2003156835
Kind Code:
A
Abstract:
To provide a pellicle for exposure using light of ≤300 nm less liable to deterioration of optical properties even after long-term use.
The pellicle comprises a pellicle membrane and a fluoropolymer containing at least one repeating unit with a cyclic structure selected from the group comprising units of formulae (1), (2), and (3) as a material of an adhesive. In the formulae, Q1, Q2, and Q3 are each represents Rf-O, Rf is a ≤10C fluoroalkylene group which may have an internal etheric oxygen atom and the fluoroalkylene group has a fluoroalkyl group which may have an etheric oxygen atom in a side chain.
Inventors:
MATSUKURA IKUO
KASHIWAGI KIMIAKI
OGAWA HAJIME
SATO MASAKUNI
SUGIYAMA TOKUHIDE
KASHIWAGI KIMIAKI
OGAWA HAJIME
SATO MASAKUNI
SUGIYAMA TOKUHIDE
Application Number:
JP2001353206A
Publication Date:
May 30, 2003
Filing Date:
November 19, 2001
Export Citation:
Assignee:
ASAHI GLASS CO LTD
International Classes:
G03F1/62; H01L21/027; (IPC1-7): G03F1/14; H01L21/027