Title:
PENTAPHENOL COMPOUND, PRODUCTION METHOD AND USE OF THE SAME
Document Type and Number:
Japanese Patent JP3799643
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To obtain a new phenol compound useful as an alkali soluble low molecular weight additive to a photo sensitive resin composition, an intermediate for a photosensitive ingredient, etc.
SOLUTION: This compound is a pentaphenol compound expressed by formula I (R1-R5 are each H, 1,2-naphthoquinonediazide-4- or -5-sulfonyl; R6-R14 are each H, a 1-6C alkyl, a 1-6C alkoxy, a 2-6C alkenyl, a 3-6C cycloalkyl; R15 is H, a 1-6C alkyl, a 2-6C alkenyl, a 3-6C cycloalkyl), e.g. a compound of formula II. The compound of formula I is obtained by carrying out the reaction of a pentaphenol compound of formula III with 1,2-naphthoquinonediazide-4- or -5-sulfonyl halide. The compound of formula III is obtained by carrying out the reaction of a dimethylol compound of formula IV with a phenol compound necessary for obtaining the compound of formula IV. From the compound of formula I or its quinonediazidesulfonic acid ester, a resin having a well balanced properties such as high sensitivity, high resolving power, high heat resistance, various properties of resist, etc., is obtained.
Inventors:
Haruki Ozaki
Application Number:
JP2607996A
Publication Date:
July 19, 2006
Filing Date:
January 18, 1996
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C39/15; G03F7/022; C07C37/16; C07C247/16; C07C317/22; C08K5/13; C08L61/04; C08L61/06; C08L101/00; (IPC1-7): C07C39/15; C07C37/16; C07C247/16; C07C317/22; C08K5/13; C08L61/06; C08L101/00; G03F7/022
Domestic Patent References:
| JP6348006A | ||||
| JP6157385A |
Attorney, Agent or Firm:
Takashi Kuboyama
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