PERFORATED MASK IN SUBSTRATE ALIGNER AND GAP CONTROL METHOD USING IT - Hitachi Electronics Engineering Co., Ltd.

Title:

PERFORATED MASK IN SUBSTRATE ALIGNER AND GAP CONTROL METHOD USING IT

Document Type and Number:

Japanese Patent JP3205811

Kind Code:

B2

Abstract:

PURPOSE: To accurately measure a gap between a pattern mask and a glass substrate nearly over the whole face in a substrate aligner.
CONSTITUTION: A plurality of holes 14, for measurement use, through which a measuring shaft part 13 at a dial gauge 12 is passed are made at prescribed intervals so as to be scattered nearly over the whole surface of the sheet face of a sheet material whose size and material are the same as those of a pattern mask on which an interconnection pattern has been formed. A perforated mask 10 is used in the following manner: it is supported by a mask chuck 2 instead of the pattern mask; it is set in such a way that the measuring shaft part 13 at the dial gauge 12 is passed through the holes 14 for measurement use; and a gap between the mask and the surface of a glass substrate 3 supported by a substrate chuck 4 situated at the lower part is measured directly.

Inventors:

Toshiyuki Kozuka
Yoshi Takehiro
Satoru Iwama
Yasuhiro Ito

Application Number:

JP35827691A

Publication Date:

September 04, 2001

Filing Date:

December 27, 1991

Export Citation:

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