Title:
How to paste the pellicle
Document Type and Number:
Japanese Patent JP6304884
Kind Code:
B2
Abstract:
A pellicle is proposed in which the frame is formed with an external horizontal slit for the purpose of receiving a pressing means, which can urge the pellicle to be adhered to a photomask, in which the slit forms a vertically protruding part of a thickness of 5 - 30 % of the width of a pellicle frame main body and a horizontally protruding part of a thickness of 0.3 - 1mm; also the method of adhering the pellicle to the photomask is proposed.
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Inventors:
Kazutoshi Sekihara
Application Number:
JP2014192378A
Publication Date:
April 04, 2018
Filing Date:
September 22, 2014
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F1/64; B65D85/86; H01L21/683
Domestic Patent References:
| JP62049153U | ||||
| JP2011002831A | ||||
| JP2011095593A |
Foreign References:
| WO2008105531A1 | ||||
| US20100323302 | ||||
| WO2009008294A1 |
Attorney, Agent or Firm:
Yukio Numazawa
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