To provide a peripheral exposure apparatus capable of exposing a photoresist in a peripheral region while drawing an identification mark with high resolution.
The peripheral exposure apparatus 100 includes: a stage 12 that moves in a first direction, mounts a substrate SW to be exposed at one end side and rotates the substrate (SW) to be exposed at the other end side from a first direction to a second direction crossing the first direction; a skeleton 13 that is disposed above the stage in the second direction; a peripheral exposure means 20 that is disposed as movable in the second direction on one side face of the skeleton in the one end side or the other end side and exposes a peripheral region; and a mark drawing means 42 that is disposed as movable in the second direction on a side face of the skeleton in the one end side or the other end side, opposite to the side face where the peripheral exposure means is disposed, and draws an identification mark relating to the pattern in the peripheral exposure region. The peripheral region of the pattern is exposed and the identification mark is drawn by reciprocating the substrate (SW) to be exposed only once.
SATO HIROAKI
IKEDA YASUHITO
KAKUI MASATO
| JP2002203765A | 2002-07-19 | |||
| JP2003029423A | 2003-01-29 | |||
| JPH08195338A | 1996-07-30 | |||
| JP2006259515A | 2006-09-28 | |||
| JP2007148358A | 2007-06-14 | |||
| JP2007148362A | 2007-06-14 | |||
| JP2002091012A | 2002-03-27 |
Nobukazu Ito