Title:
位相格子マスク
Document Type and Number:
Japanese Patent JP4281041
Kind Code:
B2
Abstract:
Provided is a photomask enabling accurate tone representation. This photomask has a transparent substrate (42), and a phase grating structured from a plurality of grooves of a fixed pitch (P) formed on said substrate, wherein at least either the depth or width of the respective grooves of the phase grating is made to bear the exposure pattern. And, when the wavelength of the exposed light of the aligner employing the photomask is set to lambda, and the incident side numerical aperture of the imaging system lens is set to NAi, P
Inventors:
Akira Miyamae
Kimio Nagasaka
Kimio Nagasaka
Application Number:
JP2002036055A
Publication Date:
June 17, 2009
Filing Date:
February 13, 2002
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
G02B5/18; G02B3/00; G02B5/32; G03F1/26; G03F1/60; G03F1/68; G03F1/76; G03F7/00; G03F7/20; G03H1/08; H01L21/027
Domestic Patent References:
| JP5257263A | ||||
| JP9043851A | ||||
| JP8146592A | ||||
| JP4204653A | ||||
| JP2001133987A | ||||
| JP2001167483A | ||||
| JP8250446A | ||||
| JP2002222548A | ||||
| JP2000181048A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Katsuro Tanaka
Shinji Oga
Katsuro Tanaka
Shinji Oga