Title:
PHASE SHIFT MASK AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JP3499714
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a phase shift mask with which resolution performance can be improved, depth of focus can be increased and image shortening can be decreased.
SOLUTION: This halftone phase shift mask 1 consists of a light-transmitting substrate 5 and a translucent film layer 7 formed on the light-transmitting substrate 1 to transfer a circuit pattern to a photosensitive material by exposure. The translucent film layer 7 contains a primary region having the transmittance t1 and a secondary region having the transmittance t2 which is higher than t1. The secondary region is formed adjacent to the circuit pattern so as to compensate decrease in the image intensity. This region can be formed by partially oxidizing the secondary region of the halftone mask layer. Thereby, image shortening can be decreased and the resolution performance of a whole pattern can be improved.
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Inventors:
Koji Hashimoto
Application Number:
JP14419097A
Publication Date:
February 23, 2004
Filing Date:
June 02, 1997
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F1/00; G03F1/26; G03F1/32; G03F1/36; G03F7/20; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
| JP6337514A | ||||
| JP561183A | ||||
| JP862822A | ||||
| JP9179287A | ||||
| JP9127677A |
Attorney, Agent or Firm:
Takehiko Suzue (6 outside)