Title:
PHASE-SPLITTING DRIVE OF PLASMA ETCHING SYSTEM
Document Type and Number:
Japanese Patent JPH02177429
Kind Code:
A
Abstract:
PURPOSE: To provide a device for maximizing the potential difference between electrodes to be used for inducing a plasma without generating any stray discharge between one of electrodes and a reaction chamber by respectively impressing two voltages, which are leveled equal in respect to the earth but shit their phases at 180 deg., to the upper and lower electrodes. CONSTITUTION: A plasma reactor 14 equipped with an upper electrolytic electrode 19 and a lower electrolytic electrode 12 inside a ground chamber, a grounding generator 12 for generating a radio frequency input voltage, means 16 for shifting the phases of 1st and 2nd voltages Vu and Ve at 180 deg. in spite of their equal levels in respect to the earth as a means for dividing that input voltage into the 1st and 2nd output voltages Vu and Ve , and means for connecting the 1st output voltage Vu to the upper electrode 19 and further connecting the 2nd output voltage Ve to the lower electrode 21 are provided. For example, the means 16 for dividing this input voltage is a transformer 20 equipped with a primary winding wire 22 and a center tap secondary winding wire 24, that primary winding wire 22 is connected to the radio frequency generator 12 and further, a center tap 28 of the secondary winding wire 24 is grounded.
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Inventors:
OGLE JOHN (US)
YIN GERALD Z (US)
YIN GERALD Z (US)
Application Number:
JP21157189A
Publication Date:
July 10, 1990
Filing Date:
August 18, 1989
Export Citation:
Assignee:
LAM RES CORP (US)
International Classes:
C23F4/00; H01J37/32; H01L21/302; H01L21/3065; H05H1/46; (IPC1-7): C23F4/00; H01L21/302
Domestic Patent References:
| JPS6342707A | 1988-02-23 | |||
| JPS61272928A | 1986-12-03 |
Attorney, Agent or Firm:
Aoki Akira (4 outside)