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Title:
PHENOL COMPOUND CONTAINING SILICON
Document Type and Number:
Japanese Patent JPH08231559
Kind Code:
A
Abstract:

PURPOSE: To obtain the subject new compound, having a small absorption wavelength, capable of shortening the wavelength of an exposure light source, having a satisfactory definition of a resist in an i-line region and useful as a component of a chemical amplified positive type resist material suitable for a microlithographic technique.

CONSTITUTION: This phenol compound containing silicon of formula I [(n) is 1 or 2; X is hydroxyl group, a 2-4C lower alkenyl, a 2-4C lower alkoxy, a 6-10C aryloxy or a group of formula II or III (Y is hydroxyl group, a 1-4C lower alkyl, a 2-4C lower alkenyl, etc.) when (n) is 1, and hydroxyl group, a 1-4C lower alkyl, a 6-10C aryl or a group of formula II or III, etc., when (n) is 2], e.g. a compound of formula IV. The compound of formula I is obtained by protecting a phenolic hydroxyl group in the corresponding halogenated phenol compound with a pyran compound, etc., then reacting the halogen site with metallic Mg, providing a Grignard reagent, reacting the resultant Grignard reagent with the corresponding chlorosilane compound, etc., and subsequently carrying out the deprotecting reaction of the pyranyl group under acidic conditions.


Inventors:
Kanbara, Hiroshi
Ueda, Takashi
Umemura, Mitsuo
Application Number:
JP1995000061643
Publication Date:
September 10, 1996
Filing Date:
February 24, 1995
Export Citation:
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Assignee:
SHIN ETSU CHEM CO LTD
International Classes:
G03F7/039; C07F7/08; C07F7/18; G03F7/075; (IPC1-7): C07F7/08; C07F7/18
Attorney, Agent or Firm:
小島 隆司