Title:
酸に不安定な保護基を有するフェノール樹脂
Document Type and Number:
Japanese Patent JP4006492
Kind Code:
B2
Abstract:
A phenolic resin in which 10-90% of the phenolic hydroxyl groups are replaced by protective groups of the formula I: in which R1 and R2 are each independently of the other are C1-C6alkyl, C3-C6cycloalkyl which is unsubstituted or is substituted by one or more C1-C4alkyl groups, or are -(CH2)n-aryl, or R1 or R2, together with the oxygen and carbon atoms attached to these radicals, form a five- to eight-membered ring which may contain, as ring members, further heteroatoms or hetero-groups such as -O-, -S-, -SO2-or -NR8-, where R8 is C1-C6alkyl, aryl or C6-C16arayl, R3 is hydrogen, C1-C6alkyl, C3-C6cycloalkyl which is unsubstituted or is substituted by one or more C1-C4alkyl groups or is -(CH2)n-aryl, or R2 and R3, together with the carbon atom attached to these radicals, form a five- to eight-membered ring which may contain, as ring members, further heteroatoms or hetero-groups such as -O-, -S-, -SO2- or -NR8-, where R8 is C1-C6alkyl, aryl or C6-C16aralkyl, n is 0, 1, 2 or 3 and aryl is naphthyl or phenyl which is substituted by one or more C1-C4alkyl, C1-C4alkoxy, nitro or cyano groups or halogen atoms, with the proviso that the ratio of the weight-average to the number-average molecular weight, Mw/Mn, is in the range 1.03-1.80 has high thermal stability and is suitable as a binder for resist compositions of high processing stability and flow resistance.
Inventors:
Reinhard Schiurtz
Karl-Lorenz Meltesdorf
Hans-Thomas Sheach
Norbert Miyunzel
Heinz Holzwald
Pasquale Alfredo Fuarciniyo
Karl-Lorenz Meltesdorf
Hans-Thomas Sheach
Norbert Miyunzel
Heinz Holzwald
Pasquale Alfredo Fuarciniyo
Application Number:
JP698296A
Publication Date:
November 14, 2007
Filing Date:
January 19, 1996
Export Citation:
Assignee:
FujiFilm Electronic Materials USA, Inc.
International Classes:
G03F7/039; C08F8/00; C08F212/14; G03F7/004; H01L21/027; H05K3/06
Domestic Patent References:
| JP9179300A | ||||
| JP9211866A | ||||
| JP3282550A | ||||
| JP5249682A | ||||
| JP6194842A | ||||
| JP7234511A | ||||
| JP6324494A | ||||
| JP6016730A | ||||
| JP5297591A | ||||
| JP5346668A | ||||
| JP6049136A | ||||
| JP4350658A | ||||
| JP4195138A | ||||
| JP6287163A | ||||
| JP2161436A | ||||
| JP7206939A |
Other References:
Y.Kawai et al.,Characteristics of a Monodisperse PHS-Based Positive RESIST(MDPR) in KrF Excimer Laser Lithography,Jpn.J.Appl.Phys.,日本,1992年12月,vol.31,p.4316-4320
Attorney, Agent or Firm:
Chika Takagi
Junji Yuda
Shoji Miwa
Junji Yuda
Shoji Miwa