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Title:
PHENOLIC NOVOLAK-TYPE VINYL ETHER AND POLYMERIZABLE COMPOSITION
Document Type and Number:
Japanese Patent JPH11349516
Kind Code:
A
Abstract:

To obtain a phenolic novolak-type vinyl ether containing phenolic novolak-type vinyl ether compounds of tetra-nuclear form and binuclear form at specific ratios and useful as a composition for ink, etc., giving a cured material exhibiting low skin stimulation and excellent adhesion.

The objective compound contains ≥30 wt.% of a tetranuclear phenolic novolak-type vinyl ether compound expressed by formula I {[R is a vinyl ether group of {(R1)p-O-}q-CH=CH2 (R1 is a 1-10C alkylene; (p) is 1-10; (q) is 0-10) or H]; the ratio of H atom/vinyl ether group is 0/100 to 70/30 (molar ratio) as an average over the whole molecule of formula I} and ≤15 wt.% of a binuclear phenolic novolak-type vinyl ether compound of formula II. The objective compound can be produced by reacting a phenolic novolak with a haloalkylenoxy vinyl compound of formula III (X is a halogen) in the presence of a basic compound.


Inventors:
OGIWARA RIEKO
OTSUKI KENJU
NOMICHI MINORU
Application Number:
JP16125098A
Publication Date:
December 21, 1999
Filing Date:
June 10, 1998
Export Citation:
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Assignee:
NIPPON KAYAKU KK
International Classes:
C07C43/215; C07C43/23; C08F16/26; C08F290/06; C08G8/36; C09D4/00; (IPC1-7): C07C43/23; C07C43/215; C08F16/26; C08F290/06; C08G8/36; C09D4/00