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Title:
PHOTO-ALIGNMENT EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2014038178
Kind Code:
A
Abstract:

To eliminate alignment disturbance near a boundary in a division region of a unit image region when a photo-alignment exposure system is applied to a multi-domain method.

A photo-alignment exposure apparatus 10 is provided, for dividing each unit image region of a liquid crystal display element into a plurality of division regions and photo-aligning an alignment material film in each division region in a direction different from others. The apparatus includes a light source unit 11 emitting exposure light, a mask pattern M corresponding to one division region of the plurality of division regions, and an optical system for irradiating an exposure target surface Bs with light emitting from the light source unit 11 through the mask pattern M. The optical system sets a first imaging plane F1 on a light emitting plane Ms of the mask pattern M and a second imaging plane F2 on the exposure target surface Bs, and includes a reflective imaging optical system 13 between the first imaging plane F1 and the second imaging plane F2.


Inventors:
HASHIMOTO KAZUSHIGE
ARAI TOSHINARI
Application Number:
JP2012179963A
Publication Date:
February 27, 2014
Filing Date:
August 14, 2012
Export Citation:
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Assignee:
V TECHNOLOGY CO LTD
International Classes:
G02F1/1337; G03F7/20
Attorney, Agent or Firm:
Eichi International Patent Office
Ritsumasa Kobashi