To provide a photo-curable composition comprising no aromatic compound which expresses high curability without using a photoinitiator and is cured to a cured form, and thereby exhibits the lowering of the blocking of the curing reaction by oxygen and thus has satisfactory hardness and satisfactory solvent resistance.
This photo-curable composition comprises a resin (A) having an acryloyl group and a chemical structure element represented by Structural Formula I: wherein R1 and R2 independently represent an alkyl or cycloalkyl group having a carbon number of 1 to 6; X1 represents a carbonyl group or a cyano group; R4 represents an alkyl or alkoxy group having a carbon number of 1 to 8; n is 1 when X1 is a carbonyl group, or 0 when X1 is a cyano group; R3 represents an alkylene group having a carbon number of 1 to 3; and X2 represents an electron-attracting group.
LACHOWICZ ARTUR
GAUDL KAI-UWE
Next Patent: COMPOSITION OF HYDROFLUOROCARBON AND HYDROCARBON