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Title:
PHOTO-CURABLE RESIN COMPOSITION FOR PREPREG
Document Type and Number:
Japanese Patent JPS588724
Kind Code:
A
Abstract:

PURPOSE: A composition for prepregs which is stable for a long time and forms a cured product having excellent properties, prepared by blending an epoxy resin modified with a polyvinyl formal or phenoxy resin, with an organic solvent and a compound which, when irradiated with light, forms a Lewis acid.

CONSTITUTION: There are blended a modified epoxy resin prepared by reacting 90W60pts.wt. epoxy resin having at least two epoxy groups in the molecule, with 10W40pts.wt. polyvinyl formal or phenoxy resin or a mixture thereof at 150W230°C; an organic solvent; and a compound which, when irradiated with light, forms a Lewis acid. As the organic solvent, there is preferably used a mixed solvent consisting of 80W60pts.wt. aromatic hydrocarbon and 20W40pts.wt. aliphatic alcohol. As the compounds which, when irradiated with light, form a Lewis acid, there are preferably used onium salts of Lewis acids. As such onium salts, there can be mentioned salts between a cation such as an aromatic iodinium cation and an anion such as BF4- or PF6-.


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Inventors:
TSUNODA MAKOTO
SATOU SADAO
SUZUKI YASUHIRO
Application Number:
JP10677481A
Publication Date:
January 18, 1983
Filing Date:
July 08, 1981
Export Citation:
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Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
C08G59/00; C08G59/20; C08G59/68; C08J5/24; C08L63/00; (IPC1-7): C08G59/20; C08G59/68; C08J5/24
Domestic Patent References:
JPS5284248A1977-07-13
JPS50158698A1975-12-22
Attorney, Agent or Firm:
Masuo Oiwa



 
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