Title:
PHOTO-RESIST PEELING COMPOSITION, PHOTO-RESIST PEELING METHOD AND MANUFACTURING METHOD FOR DISPLAY UNIT USING THE SAME
Document Type and Number:
Japanese Patent JP2009120833
Kind Code:
A
Abstract:
To provide a composition for peeling a photo-resist capable of reusing without the reduction of an essential peeling capability or a damage of a metallic pattern and capable of reducing an expense in a photoetching process.
The composition for peeling a photo-resist contains a sulfone type compound of 80-98.5 mass%, a lactone type compound of 1-10 mass% and an alkyl sulfonic acid of 0.1 to 5 mass%.
Inventors:
HONG SUN-YOUNG
PARK HONG-SICK
CHOUNG JONG-HYUN
KIM BONG-KYUN
LEE JI-SUN
LEE BYEONG-JIN
KIM BYUNG UK
YOON SUK-IL
KIM SEONG BAE
SHIN SUNG GUN
HUH SOON BEOM
PARK HONG-SICK
CHOUNG JONG-HYUN
KIM BONG-KYUN
LEE JI-SUN
LEE BYEONG-JIN
KIM BYUNG UK
YOON SUK-IL
KIM SEONG BAE
SHIN SUNG GUN
HUH SOON BEOM
Application Number:
JP2008279711A
Publication Date:
June 04, 2009
Filing Date:
October 30, 2008
Export Citation:
Assignee:
DONGJIN SEMICHEM CO LTD
International Classes:
C11D7/50; B08B3/08; C09D9/04; C09K3/00; C11D7/26; C11D7/34; G02F1/1368; H01L21/027; H01L21/304
Attorney, Agent or Firm:
Kunihisa Landlord
Atsushi Hayashi
Atsushi Hayashi
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