To obtain the subject photo-sensitive paste that can attain pattern processing of high aspect ratio and high definition in low costs and is useful in the plasma display or the like by admixing a specific photo-sensitive polymer to a photo-sensitive organic component.
This paste comprises (A) inorganic fine particles and (B) photo- sensitive organic components in which the component B includes a photo-sensitive polymer prepared by ring-opening polyaddition reaction of (i) an unsaturated group-bearing alicyclic epoxy compound to (ii) a carboxyl group-bearing copolymer. In a preferred embodiment, the component B is a compound of the formula (R is H or methyl), the component (i) is a copolymer of (meth)acrylate ester(s) and (meth)acrylic acid(s) and the weight ratio of the component A to the component B is (5-50 wt.%)/(95-50 wt.%). The component (A) has the glass transition point of 430-500°C and the softening point of 470-580°C and includes a glass powder containing lithium oxide with the average particle size of 2-3.5 μm.
UEGAKI HIROKO
TABATA KENICHI
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