Title:
PHOTOACID GENERATOR FOR CHEMICALLY AMPLIFIED POSITIVE RESIST MATERIAL, RESIST MATERIAL USING THE SAME AND PATTERN FORMING METHOD
Document Type and Number:
Japanese Patent JP2004133393
Kind Code:
A
Abstract:
To provide a chemically amplified positive resist material having excellent resolution and focal latitude and exhibiting little variation of line width and little shape distortion even when PED (post exposure delay) lasts over a long period of time.
A photoacid generator for the chemically amplified positive resist material generates 2,4,6-triisopropylbenzenesulfonic acid and is represented by formula (1), wherein G and G' are each S or -CH=CH- with the proviso that both G and G' are not simultaneously S; a plurality of symbols R may be the same or different and are each H, F, Cl or a 1 to 4C linear, branched or cyclic substituted or unsubstituted alkyl or alkoxy; and k is an integer of 0 to 4.
Inventors:
MAEDA KAZUNORI
OSAWA YOICHI
WATANABE SATOSHI
OSAWA YOICHI
WATANABE SATOSHI
Application Number:
JP2003205698A
Publication Date:
April 30, 2004
Filing Date:
August 04, 2003
Export Citation:
Assignee:
SHINETSU CHEMICAL CO
International Classes:
G03F7/004; C08F212/14; C08F220/10; C08F232/08; C09K3/00; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; C08F212/14; C08F220/10; C08F232/08; C09K3/00; G03F7/039; H01L21/027
Domestic Patent References:
| JP2003137860A | 2003-05-14 | |||
| JP2003177536A | 2003-06-27 | |||
| JP2002202603A | 2002-07-19 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Saori Shigematsu
Katsunari Kobayashi