Title:
光酸発生剤並びにこれを用いたレジスト材料及びパターン形成方法
Document Type and Number:
Japanese Patent JP5124805
Kind Code:
B2
Abstract:
Sulfonate salts have the formula: HOCH2CH2CF2CF2SO3−M+ wherein M+ is a Li, Na, K, ammonium or tetramethylammonium ion. Onium salts, oxime sulfonates and sulfonyloxyimides derived from these salts are effective photoacid generators in chemically amplified resist compositions.
Inventors:
Katsuhiro Kobayashi
Yoichi Osawa
Tsuyoshi Kanao
Takeshi Watanabe
Yoichi Osawa
Tsuyoshi Kanao
Takeshi Watanabe
Application Number:
JP2006176044A
Publication Date:
January 23, 2013
Filing Date:
June 27, 2006
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
G03F7/004; G03F7/039; H01L21/027; C07C309/08; C07C381/12
Domestic Patent References:
| JP2005148291A | ||||
| JP2002214774A | ||||
| JP9095479A | ||||
| JP9208554A | ||||
| JP9301948A | ||||
| JP2005227645A | ||||
| JP2003149815A | ||||
| JP2007328060A |
Foreign References:
| US20030235779 | ||||
| WO2006121096A1 |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa
Saori Shigematsu
Katsunari Kobayashi
Takeshi Ishikawa