Title:
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING THE SAME
Document Type and Number:
Japanese Patent JP2013080234
Kind Code:
A
Abstract:
To provide new photoacid generator compounds which can be used in both positive and negative photoresist compositions, and photoresist compositions that comprise the compounds.
A photoresist composition comprises a resin binder and a photoacid generator compound in an amount sufficient to permit development of an exposed coating layer of the composition. The photoacid generator generates α,α-difluoroalkyl sulfonic acid upon exposure to radiation.
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Inventors:
JAMES F CAMERON
ZYDOWSKY THOMAS M
ZYDOWSKY THOMAS M
Application Number:
JP2012255880A
Publication Date:
May 02, 2013
Filing Date:
November 22, 2012
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
G03F7/004; C07B61/00; C07C17/263; C07C22/08; C07C25/02; C07C303/20; C07C303/32; C07C309/24; C07C381/12; C09K3/00; G03F7/038; G03F7/039; H01L21/027
Foreign References:
| WO2000008525A1 | 2000-02-17 |
Attorney, Agent or Firm:
Norio Saeki