Title:
PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME
Document Type and Number:
Japanese Patent JP2017226682
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide new methods for synthesis of photoacid generator compounds (PAGs), new photoacid generator compounds and photoresist compositions that comprise such PAG compounds.SOLUTION: The present invention provides a method for producing a sulfonium compound to be a photoacid generator compound, comprising cyclizing an alkylthio compound by the process described in Scheme 2.SELECTED DRAWING: None
Inventors:
LI MINGQI
AQAD EMAD
KONG LIU
MATTIA JOSEPH
CHENG BAI SU
BARCLAY GEORGE G
AQAD EMAD
KONG LIU
MATTIA JOSEPH
CHENG BAI SU
BARCLAY GEORGE G
Application Number:
JP2017150702A
Publication Date:
December 28, 2017
Filing Date:
August 03, 2017
Export Citation:
Assignee:
ROHM & HAAS ELECT MAT
International Classes:
C07C309/12; C07C381/12; C07D333/46; C07D493/18; C07J9/00; C09K3/00; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2005041857A | 2005-02-17 | |||
| JP2008007410A | 2008-01-17 | |||
| JP2005099556A | 2005-04-14 | |||
| JP2010020204A | 2010-01-28 | |||
| JP6228353B2 | 2017-11-08 | |||
| JP6138179B2 | 2017-05-31 | |||
| JP5809798B2 | 2015-11-11 | |||
| JP2003195489A | 2003-07-09 |
Other References:
BEAK P. ET AL., JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, vol. 104, JPN6018008446, 1982, pages 4450 - 4457, ISSN: 0004110448
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office